Thermal Desorption of Copper from Iridium Surface.
DOI:
https://doi.org/10.37376/ljst.v14i2.7201Keywords:
Activation energy, Field emission microscope, Rate of contamination, Field emission current, hermal desorption, Electron emission, spot welding, Potential leads, Cold finger, Arrhenius plots, DesorptionAbstract
Desorption of copper from iridium surface has been investigated and the activation energy of this process was evaluated on the whole tip surface of iridium field emitter using a field emission microscope which was designed to permit measurement of electron emission from the emitter surface under ultra-high vacuum (UHV) conditions( and extreme cleanliness. The level of contamination could be closely monitored by observing the change in field emission current with time at constant applied voltage. In the presence of even small amounts of an active gas, a persistent decay of the field emission current with time was observed and the system was judged to be clean enough to commence the experimental work only when the The activation energy for desorption was derived from the least square analysis of the Arrhenius plots to be equal to
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